The DA3 is most commonly used to replenish Resolve R211 and 9033 developer chemistry.
The DA3 has an internal proportioning pump that will draw developer concentrate directly from the drum and dilute it to the correct strength before replenishment to the working sump.
The DA3 also has a pump for the addition of antifoam, however, this function can be disabled if not require.
The EC3 is an automatic analyser designed for use with Circuposit Electroless Copper 3350 process.
When the copper concentration falls below the low pre-set value, replenishment via metering pumps commences to maintain optimum concentrations of copper.
When the copper concentration is greater than the high pre-set value, the pumps are turned off.
The EN3 is a two channels automatic analyser designed for use with Ronamax and Everon electroless nickel processes.
When the nickel concentration and/or pH fall below their pre-set values, replenishment via
metering pumps commences to maintain optimum pH and concentrations of nickel and hypophosphite.
The SA3 is an automatic replenishment system designed for use with Rohm and Haas Electronic Materials resist stripping chemistry.
The SA3 is most commonly used to replenish SurfaceStrip 510 or similar products.
The SA3 has an internal proportioning pump that will draw developer concentrate directly from the drum and dilute it to the correct strength before replenishment to the working sump.
The SA3 also has a pump for the addition of antifoam, however, this function can be disabled if not required.
The SP3 is an automatic replenishment system designed for use with Rohm and Haas Electronic Materials copper microetch chemistry.
The SP3 is most commonly used to replenish 3330 microetch chemistry.
The SP3provides an electrical output to operate a pump to add premixed microetch chemistry in accordance with the product data sheet.
The Ronalyser EN5 is an automatic analyser/controller designed for use with electroless nickel processes, to maintain the plating conditions at their optimum.
The EN5 samples the solution and when the nickel concentration falls below a pre-set value, replenishment of nickel and hypophosphite is made in an precise ratio by a volumetric dosing system. When the pH exceeds pre-set values, addition of either acid or ammonia is made via metering pumps to maintain optimum pH.
The nickel concentration, pH and temperature are measured and displayed every second, they are alsoaveraged over 64 seconds and these average values are used for data logging and to compute the output for control of the dosing system. At the start of each 64 second period additions of acid or ammonia are initiated if required, the volumetric dosing system is also initiated by a 5 second pulse.
The 3 outputs for these addition systems also have manual override switches to set automatic, off, or on.
The time that each pump is on is used to compute the additions of each of the concentrates.
The Ronalyser EN5 requires a volumetric dosing unit for nickel and hypophosphite and two metering pumps, for the addition of acid and ammonium hydroxide.
The EN5 can be adjusted to operate over wide ranges of nickel concentration and pH.