Vacuum Applicator VA 7124-HP3 SEMI

The Vacuum Applicator VA 7124-HP3 SEMI is a standalone machine, designed and built to ensure complete elimination of air from the surfaces of substrate, as well as perfect encapsulation of the traces. The machine has been developed for simultaneous application on both sides of the substrate (wafers, touch screen, etc.) in order to achieve high lamination quality and excellent conformation to fine patterns with dry film photoresist.
The machine ensures a perfect adhesion of the products and that there are no air bubbles.
The Vacuum Applicator VA 7124-HP3 SEMI employs heat, vacuum and high lamination pressure.
The machine is provided with a data management system to supervise and control the process parameters via an appropriate software and it is pre-set for barcode reader.

Advantages

  • Mirror stainless steel construction-suitable for high level clean room operation
  • Suitable for substrate – full range from 0,05÷12,7 mm (0.002÷0.5 in.) thickness
  • Dynamic and static slap down cycles
  • Lamination pressure adjustable up to 3 Kg/cm2 (42 PSI)
  • Greatly reduces materials waste
  • Vacuum chamber size up to 635 x 635 (25 x 25 in.)
  • Equipped with dry vacuum pump
  • State-of-the-art vacuum technology
  • OMRON PLC – operator interface in various languages by touch screen display 8” or industrial touch PC/Display 12” as an option
  • Maximum lamination temperature 130°C (266°F)-platens’ temperature is individually controlled
  • Comfortable access to the vacuum chamber for cleaning or maintenance operation
  • High temperature film release roll to roll (option)
  • Upper plate opening by motor screw jack
  • Complain with UL & Semi directives